Arrays of holes fabricated by electron-beam lithography combined with image reversal process using nickel pulse reversal plating

Pulse Reversal PermAlloy Plating Process for MEMS Applications

Plasmonic Response of Gold Nanoparticles Arrays Made by Nanosphere Lithography and Electron Beam Lithography

Metallic nanoparticles in the 10-100 nm size range exhibit a very specific optical response in the visible spectrum. Here we present our work towards possible applications of such particles for the design of highly sensitive and miniaturized biosensors. Fabrication of nanoparticles is discussed, comprising hexagonal arrays of truncated tetrahedrons made by nanosphere lithography (NSL), and nano...

Controlling plasmon line shapes through diffractive coupling in linear arrays of cylindrical nanoparticles fabricated by electron beam lithography.

The effect of diffractive coupling on the collective plasmon line shape of linear arrays of Ag nanoparticles fabricated by electron beam lithography has been investigated using Rayleigh scattering spectroscopy. The array spectra exhibit an intricate multi-peak structure, including a narrow mode that gains strength for interparticle distances that are close to the single particle resonance wavel...

Sensing Performance of Precisely Ordered TiO2 Nanowire Gas Sensors Fabricated by Electron-Beam Lithography

In this study, electron beam lithography, rather than the most popular method, chemical synthesis, is used to construct periodical TiO(2) nanowires for a gas sensor with both robust and rapid performance. The effects of temperature on the sensing response and reaction time are analyzed at various operation temperatures ranging from 200 to 350 °C. At the optimized temperature of 300 °C, the pro...

Three-dimensional diffractive micro- and nano-optical elements fabricated by electron-beam lithography

The broad development of the microand nano-technologies in the past few years increased the need of techniques capable of fabricating sub-micron structures with arbitrary surface profiles. Out of the several fabrication approaches (HEBS lithography, laser writing, etc.) the electron beam writing stands out as the one capable of the highest resolution, superior alignment accuracy and very small ...